The innovation on coating technology of industrial tools developed by Dr. Henry J. Ramos at the Plasma Physics Laboratory of the University of the Philippines’s National Institute of Physics (UP-NIP) was awarded a patent last March 16, 2007 by the Taiwan Intellectual Patent Office. Entitled Titanium Nitride Thin Film Formation on Metal Substrate by Chemical Vapor Deposition in a Magnetized Sheet Plasma Source, the patent is effective for a duration of 20 years starting from the filing date of the patent application, October 28, 2002.
The Titanium Nitride Thin Film Formation on Metal Substrate by Chemical Vapor Deposition in a Magnetized Sheet Plasma Source is a coating technology for tools made of metals and alloys. It introduces titanium nitride (TiN) coating produced by locally manufactured magnetized sheet plasma source as an alternative to most of the coating technology today such as the commonly used carbide coating. Carbide coating is necessary to industries for it improves the quality and extends the lifetime of tools used in industrial processes such as cutting, engraving, and milling. However, carbide coating technology is not locally available in the Philippines, thus, resulting in costly investments for coated tools.
Dr. Ramos’s technological innovation is a special way of producing a more economical and effective coating for industrial tools using plasma, which is TiN coating. TiN coating technology is presently used in hardening cutting tools. It has many desirable characteristics which gives TiN coating an edge over other coating technology. Aside from the aesthetically pleasing yellow-gold color of titanium nitride, its nonstick property and its ability to maintain the sharpness of tools, TiN increases the surface hardness of tools that protects them from abrasion and the damaging effects of friction during industrial processes. In sum, TiN coating provides increased durability, wear resistance, and corrosion resistance which prolong the lifetime of tools while creating better finishes.
The Plasma Enhanced Chemical Vapor Deposition (PECVD) is the process technology developed by the inventor to derive the titanium nitride. Using the Sheet Plasma Negative Ion Source, the components required for the formation of TiN are separated from the composition of plasma. Nitrogen gas is then added as a reactive gas which creates a chemical reaction, thus, producing the titanium nitride coating. The process is done not only in a short period of time and but also without heating the tool to be coated which is usually necessary in coating processes.
This TiN coating technology is initially tested on cutting tools; extrusion dies; and punchers and dies. However, according to Dr. Ramos, there are other potential applications of this technology. These include aerospace components, automotive parts, broaches, decorative accessories, dental instruments, door hardware, eyeglass frames, firearms components, food processing equipment, hobs, jewelry, marine hardware, medical devices, pharmaceutical equipment, plastic molds, plumbing fixtures, precision gears, sporting goods, surgical implants and writing instruments.
Patent applications for the TiN coating technology utilizing the magnetized sheet plasma source has also been filed in Singapore, Japan, People’s Republic of China, United States of America and Europe.
Dr. Henry J. Ramos is a professor of Physics and program coordinator of the Plasma Physics Lab at the National Institute of Physics, University of the Philippines, Diliman where he was the director from May 1993-April 1996 and June 1997-May 2000. His expertise is in the field of Experimental Plasma Physics. He has been a frequent visiting scientist in Japan and author of several scientific publications in international journals such as the Japanese Journal of Applied Physics, Thin Solid Films and the Nuclear Instruments and Methods in Physics Research.
