Photomask Japan 2007
Kanagawa, Japan - The aim of the symposium is to bring together engineers and investigators from all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends.
Photomask Japan 2007 is the 14th international symposium on photomasks and NGL masks in Japan.
The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.
Papers are solicited on the following and related topics:
Mask Cost and Mask Development Strategy
Materials of and for Photomasks
Fabrication Process Steps and Equipments for Photomasks (process and equipments for developing, etching, cleaning, and so on)
Photomask Writing Tools and Technologies
Metrology Tools and Technologies
Inspection Tools and Technologies
Repairing Tools and Technologies
Mask Data Preparations
EDA for Photomask
Photomasks with RET: PSM, Masks with OPC
Photomask relating Lithography Technologies
NGL Masks: EUV, E-Beam, Imprint etc.
