Symposium on Photomask and Next Generation Lithography Mask Technology XVIII, Photomask Japan
Photomask Japan 2011 is the 18th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends.
The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.
Topics:
*Materials of and for Photomasks
*Fabrication Process Steps and Equipments for Photomasks
(process and equipments for developing, etching, cleaning etc.)
*Photomask Writing Tools and Technologies
*Metrology Tools and Technologies
*Inspection Tools and Technologies
*Repairing Tools and Technologies
*Mask Data Preparations
*EDA and DFM for Photomask
*Photomasks with RET: PSM, Masks with OPC
*Photomask-relating Lithography Technologies
*EUV masks and Infrastructure
*NGL masks and Application: Nano-imprint, Patterned media etc.
*Strategies and Business Challenges: Cost, Cycle-Time, ML2 etc.
Date: Wednesday, April 13 － Friday, April 15, 2011
Venue: Annex Hall, Pacifico Yokohama, Yokohama Japan
Official Language: English
Banquet: April 13, 2011
Exhibition: Wednesday, April 13 and Thursday, April 14
Contact: pmj(at)ics-inc.co.jp
