[ICPST-28] 28th International Conference of Photopolymer Science and Technology

The 28th International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Micro-lithography and Nanotechnology (ICPST-28)) organized by CPST, will be held at University Convention Hall, Chiba University, Japan on June 21-24, 2011. All the contributorsof papers on the scientific progress and the technical develop-ment of photopolymers are cordially invited.

For more information follow the links below or contact:

mkuzuya(at)cc.matsuyama-u.ac.jp